Reparative Hydrating Essence
ConditionBrand New - Still in Box - 100% product remaining
Formulated with 79% of Centella Asiatica Extract, SOURCE calms and repairs skin’s barrier function while deeply hydrating and moisturizing the skin. Made with only 26 ingredients, this stress-free, back-to-basics essence will be your new staple in your skincare routine.
- Suitable for all skin types
- pH balancing: pH 5.5 (±0.5)
- Free of: Alcohol, Essential Oil, Derivative of Coconut, Dye, Fragrance, Gluten, Paraben, PEG, Phthalate, Silicone, Soy, and Sulfate
Centella Asiatica Extract, Butylene Glycol, Squalane, Glycerin, 1,2-Hexanediol, Polyglyceryl-6 Oleate, Caprylic/Capric Triglyceride, Limnanthes Alba (Meadowfoam) Seed Oil, Trehalose, Niacinamide, Hyaluronic Acid, Sodium Hyaluronate, Lactobacillus Ferment, Arginine, Punica Granatum Fruit Extract, Simmondsia Chinensis (Jojoba) Seed Oil, Anthemis Nobilis Flower Water, Acetyl Hexapeptide-8, Water, Xanthan Gum, Caprylyl Glycol, Potassium Olivate, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Hydroxyethyl Acrylate/Sodium Acryloyldimethyl Taurate Copolymer, Sodium Phytate, Sorbitan Isostearate
Following your AM / PM cleansing, dispense product into hands and pat gently onto face and neck until absorbed. Reapply the product if your skin is craving extra hydration. Follow with the rest of your skincare routine. Recommended for daily use.
Avoid contact with eyes. If contact occurs, rinse with water.